Kleinostheim, Germany

Doerte Eggers

This inventor holds 1 USPTO granted patent. Top assignee: Excelitas Noblelight Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Doerte Eggers. Retrieved from https://idiyas.com/inventor/doerte-eggers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Doerte Eggers and Infrared Drying Innovation.

Introduction

Doerte Eggers is an inventor associated with Kleinostheim, Germany, and Excelitas Noblelight GmbH. His patent work addresses infrared drying technology, particularly for materials such as solvent-containing and water-based printing inks.

Latest Patents

Eggers is credited with 1 patent: “Method for Drying a Material for Irradiation, and Infrared Irradiation Device for Carrying Out Said Method.” The invention concerns an infrared irradiation device with a radiator unit and a counter-reflector. Its reflector wall includes inlet openings that admit cooling gas into the reflector space, as well as at least one outlet opening that conducts waste air out of that space. This arrangement is intended to support rapid drying while reducing bubble formation and condensation within the reflector space.

Career Highlights

Eggers’s documented patent contribution focuses on improving the performance of infrared drying equipment. The proposed airflow through the reflector space is designed to address practical challenges in drying printed materials, including water-based inks.

Collaborations

Eggers is associated with Excelitas Noblelight GmbH. His listed coworker is Jens Büngener.

Conclusion

Doerte Eggers’s patent describes an infrared drying approach that manages airflow through the reflector space to promote efficient drying while limiting bubbles and condensation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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