Chungcheongnam-do, South Korea

Do Youn Lim

This inventor holds 1 USPTO granted patent. Top assignee: Semes C0., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Do Youn Lim. Retrieved from https://idiyas.com/inventor/do-youn-lim-07y9bkj6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Do Youn Lim - Innovator in Substrate Support Technology

Introduction

Do Youn Lim is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate support technology, holding a patent that showcases his innovative approach to engineering solutions.

Latest Patents

Do Youn Lim holds a patent for a "Supporting structure, apparatus for supporting substrate and facility for processing substrate." This invention includes a support plate that supports a substrate, a lower cover that covers the lower portion of the support plate, and a catching unit featuring a concave-convex structure. This design allows for the rotation and assembly of the support plate and the lower cover, enhancing the efficiency of substrate processing.

Career Highlights

Do Youn Lim is currently employed at Semes Co., Ltd., where he continues to develop and refine technologies related to substrate support. His work has been instrumental in advancing the capabilities of processing facilities.

Collaborations

He collaborates with talented coworkers, including Jae Hun Jeong and Cheol Yong Shin, contributing to a dynamic team environment that fosters innovation.

Conclusion

Do Youn Lim's contributions to substrate support technology exemplify his commitment to innovation and engineering excellence. His patent reflects a significant advancement in the field, and his ongoing work at Semes Co., Ltd. promises to yield further advancements in substrate processing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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