Do Hwan Jung

Title: Do Hwan Jung: Substrate Processing and Plasma Treatment Patents

Introduction

Do Hwan Jung is an inventor associated with Semes Co., Ltd. in Cheonan, South Korea. His patent work focuses on substrate-processing equipment that uses microwaves to generate plasma, including methods for maintaining the apparatus and removing byproducts or impurities. Jung is credited with 2 patents.

Latest Patents

**Method of Treating Substrate.** This patent describes a process for treating substrates with plasma generated in a treatment space using microwaves. After plasma treatment has been performed a preset number of times, a component of the apparatus is replaced. The apparatus is then backed up through a bake purge operation that removes byproducts from the component.

**Apparatus for Processing Substrate and Method of Processing Substrate.** This patent covers substrate processing with microwave-generated plasma, followed by component replacement after a predetermined number of treatment cycles. Its backup procedure includes preheating the processing space by increasing the temperature of the coolant supplied to the process chamber, followed by a bake purge operation to remove impurities from the component.

Career Highlights

Jung’s listed patent contributions address equipment maintenance and process reliability in plasma-based substrate treatment. The described procedures combine scheduled component replacement with post-replacement conditioning intended to remove residue and impurities.

Collaborations

Jung’s listed coworkers include Sang Lim Kim and Hyun Kyu Choi. His patent work is associated with Semes Co., Ltd.

Conclusion

Do Hwan Jung’s two listed patents focus on maintaining microwave plasma substrate-processing equipment through component replacement, preheating, and bake purge procedures.