Yongin, South Korea

Do-Hun Phun

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sdi Co., Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Do-Hun Phun. Retrieved from https://idiyas.com/inventor/do-hun-phun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: **Do-Hun Phun: Innovator in Cathode Ray Tube Technology**

Introduction

Do-Hun Phun, an esteemed inventor based in Yongin-si, South Korea, has made significant contributions to technology through his innovative work in the field of cathode ray tubes. With one patent to his name, Phun has showcased his ability to blend creativity with practical engineering solutions.

Latest Patents

Phun's notable patent is a "Shadow mask for cathode ray tube." This invention focuses on a design that integrates a faceplate panel featuring an inner phosphor screen. The innovative shadow mask includes a front surface formed with a beam-guide portion comprising multiple apertures, surrounded by a non-opening portion. Additionally, the sidewall is bent from the non-opening portion at an angle, securing the mask to the panel through a mask frame. A unique aspect of his design is the predetermined waved pattern on the front surface, which is positioned in at least one direction, enhancing the overall efficiency of the cathode ray tube.

Career Highlights

Currently, Do-Hun Phun is a key member of Samsung SDI Co., Inc., where he actively contributes to the development of advanced technological solutions. His dedication to innovation and excellence has been instrumental in the formulation of cutting-edge display technologies that play a crucial role in modern electronics.

Collaborations

Throughout his career, Phun has had the opportunity to work alongside talented colleagues, including Kwang-sik Lee and Dong-Hwan Kim. These collaborations have fostered a rich environment of creativity and problem-solving, enabling the team to push the boundaries of current technologies and explore new possibilities.

Conclusion

Do-Hun Phun's journey as an inventor exemplifies the impact one individual's creativity can have on technology. His patent for the shadow mask in cathode ray tubes signifies a vital advancement in display technology. With ongoing contributions at Samsung SDI Co., Inc., Phun is undoubtedly poised to continue influencing the field with his innovative spirit.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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