Changwon-si, South Korea

Do-Geun Kim

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2015-2024

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Do-Geun Kim

Introduction

Do-Geun Kim is a prominent inventor based in Changwon-si, South Korea. He has made significant contributions to the field of electronics and materials science, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is titled "Substrate comprising plasmonic continuous film with curved surface and manufacturing method thereof." This invention focuses on a substrate designed for ultrasensitive spectroscopic sensors. It features bowl-shaped plasmonic curved nanodimples and spiked plasmonic nanotips, which enhance the total volume of hotspots, allowing for the concentration and analysis of extremely small sample amounts.

Another notable patent is "Electronic device and method of fabricating the same." This invention describes an electronic device that includes auxiliary interconnections on a substrate, a light extraction layer, and a first electrode. The design improves the electrical properties of the device, resulting in uniform light emission characteristics.

Career Highlights

Do-Geun Kim has worked with esteemed organizations such as the Electronics and Telecommunications Research Institute and the Korea Electrotechnology Research Institute. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Some of his notable coworkers include Jeong Ik Lee and Jonghee Lee. Their collaborative efforts have likely played a role in the successful development of his patents and innovations.

Conclusion

Do-Geun Kim's work exemplifies the spirit of innovation in the field of electronics and materials science. His patents reflect a commitment to advancing technology and improving device performance. His contributions are significant and continue to influence the industry.

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