Moscow, Russia

Dmitry Lebedev

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dmitry Lebedev. Retrieved from https://idiyas.com/inventor/dmitry-lebedev

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Dmitry Lebedev: Innovator in Image Enhancement Technology

Introduction

Dmitry Lebedev is a prominent inventor based in Moscow, Russia. He has made significant contributions to the field of image enhancement technology. His innovative approach focuses on improving luminance contrast by taking ambient illuminance into account.

Latest Patents

Dmitry holds a patent for a method and apparatus for image enhancement that considers ambient illuminance. The patent, titled "Method of, and apparatus for image enhancement taking ambient illuminance into account," outlines a process that includes calculating original-luminance contrast, fade-luminance, defade-luminance, and display-luminance. This method effectively reduces the fade phenomenon by adjusting luminance based on ambient conditions.

Career Highlights

Dmitry is currently employed at Samsung Electronics Co., Ltd., where he continues to develop and refine his innovative technologies. His work has garnered attention for its practical applications in enhancing image quality across various devices.

Collaborations

Dmitry has collaborated with notable colleagues, including Seong-deok Lee and Chang-veong Kim. Their combined expertise has contributed to advancements in the field of image processing.

Conclusion

Dmitry Lebedev's contributions to image enhancement technology demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in the way images are processed, ensuring better quality for users.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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