Dmitry Gorelik

Title: Dmitry Gorelik: Innovator in Overlay Metrology

Introduction

Dmitry Gorelik is a notable inventor based in Migdal Haemek, Israel. He has made significant contributions to the field of overlay metrology, holding a total of 3 patents. His work focuses on enhancing measurement techniques that are crucial for semiconductor manufacturing.

Latest Patents

Gorelik's latest patents include innovative technologies that improve overlay metrology tools. One of his patents describes a tool that features an illumination source capable of generating two orthogonally polarized illumination beam distributions. This tool is designed to sequentially illuminate cell pairs on an overlay target, allowing for precise measurements of orthogonally-oriented grating-over-grating structures. Another patent focuses on a multipole illumination system that utilizes acousto-optic deflectors to create a symmetric distribution of illumination beams. This technology aims to enhance the efficiency of scatterometry overlay measurements.

Career Highlights

Dmitry Gorelik is currently employed at Kla Corporation, a company renowned for its advanced metrology and inspection solutions. His role involves developing cutting-edge technologies that push the boundaries of measurement accuracy in the semiconductor industry.

Collaborations

Gorelik has collaborated with esteemed colleagues such as Andrew V Hill and Amnon Manassen. These partnerships have fostered innovation and contributed to the advancement of overlay metrology techniques.

Conclusion

Dmitry Gorelik's contributions to overlay metrology exemplify his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in precise measurements, making him a valuable asset to Kla Corporation and the field at large.