Moscow, Russia

Dmitri Alexandrovich Farmakovski

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sensortec Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dmitri Alexandrovich Farmakovski. Retrieved from https://idiyas.com/inventor/dmitri-alexandrovich-farmakovski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Dmitri Alexandrovich Farmakovski: Innovator in Potentiometric Sensors

Introduction

Dmitri Alexandrovich Farmakovski is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of sensor technology, particularly in the development of highly sensitive potentiometric sensors. His innovative work has garnered attention in the scientific community.

Latest Patents

Dmitri holds 1 patent for his invention titled "Methods for producing highly sensitive potentiometric sensors." This invention focuses on the preparation of sensors that utilize an electroconductive polymer film as a sensing element, enhancing their sensitivity and performance.

Career Highlights

Dmitri is currently employed at Sensortec Limited, where he continues to advance his research and development efforts in sensor technology. His work at the company has positioned him as a key player in the industry, contributing to the evolution of sensor applications.

Collaborations

Dmitri has collaborated with notable colleagues, including Duncan Ross Purvis and Olga Leonardova. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Dmitri Alexandrovich Farmakovski is a distinguished inventor whose work in potentiometric sensors exemplifies the spirit of innovation. His contributions to the field are paving the way for future advancements in sensor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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