Munich, Germany

Dirk Trottnow

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Lufthansa Technik Ag. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Dirk Trottnow: Innovator in Aerodynamic Technology

Introduction

Dirk Trottnow is a notable inventor based in Munich, Germany. He has made significant contributions to the field of aerodynamic technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency of aerodynamic surfaces.

Latest Patents

Dirk Trottnow holds a patent for an "Apparatus for attaching aerodynamically functional films and use thereof." This apparatus is designed for attaching an aerodynamically functional film to the surface of a body around which flow passes. The invention includes a self-adhesive, redetachable positioning film that features positioning aids for precise placement on the surface. Additionally, it has at least one application area for the aerodynamically functional film that is to be applied. This patent showcases his commitment to advancing aerodynamic applications.

Career Highlights

Dirk Trottnow is associated with Lufthansa Technik AG, a leading company in the aviation industry. His role there allows him to apply his innovative ideas in a practical setting, contributing to the development of advanced technologies in aviation.

Collaborations

Dirk has collaborated with talented coworkers such as Oliver Oeser and Andreas Flanschger. Their combined expertise fosters a creative environment that drives innovation within their projects.

Conclusion

Dirk Trottnow's contributions to aerodynamic technology through his patent and work at Lufthansa Technik AG highlight his role as a significant inventor in the field. His innovative approach continues to influence advancements in aviation technology.

Profile summary based on public USPTO records.
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