Dulsburg, Germany

Dirk Nachrodt


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: **Dirk Nachrodt: Innovator in Thin-Film Resistor Technology**

Introduction

Dirk Nachrodt, an inventor based in Dulsburg, Germany, has made significant contributions to the field of thin-film resistor technology. Known for his innovative approach, he holds one patent that exemplifies his expertise and dedication to advancing electrical engineering.

Latest Patents

Dirk Nachrodt's notable patent is titled "Thin-film resistor with a layer structure and method for manufacturing a thin-film resistor with a layer structure." This invention describes a thin-film resistor that includes a titanium (Ti) layer and a titanium nitride (TiN) layer. The unique aspect of this patent lies in the careful selection of the layer thicknesses of both the Ti and TiN layers to achieve a resulting temperature coefficient of resistance (TCR) of less than 1000 ppm/°C. This innovation is crucial for enhancing the performance and reliability of electronic components.

Career Highlights

Throughout his career, Dirk Nachrodt has been associated with esteemed institutions such as the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. and Universität Duisburg-Essen. His work at these renowned organizations provided him with the platform to explore and develop advanced technologies in the field of resistors and electronics.

Collaborations

Dirk has collaborated with notable colleagues, including Heinz Deiters and Susanne Linnenberg. Together, they have contributed to important projects and initiatives that further the understanding and application of thin-film technology in various industrial settings.

Conclusion

Dirk Nachrodt's contributions to the realm of thin-film resistors underscore his role as an innovative thinker and inventor. With his sole patent highlighting significant advancements in electrical engineering, he continues to inspire future generations of inventors and researchers. His affiliations and collaborations reflect a commitment to excellence in technology development, making him a noteworthy figure in the industry.

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