This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Valeo Sylvania L.c.c., Osram Sylvania Inc.. Active years: 2003-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003-2010
Title: Dirk-Martin Skirha, III: Innovator in Molding Technology
Introduction
Dirk-Martin Skirha, III is a notable inventor based in Seymour, Indiana, known for his contributions to molding technology. With a total of three patents to his name, he has made significant advancements in the field of manufacturing and design.
Latest Patents
One of his latest patents is for an innovative method called "In-mold dual shot masking." This method involves selectively applying a pattern to a molded part through a series of steps. It begins with forming a mold and molding a three-dimensional object from a first material. The process includes masking the object with a reverse image of a desired pattern while it remains in the mold. Following this, the object is overmolded with a second material to provide the reverse image. Finally, the object is removed from the mold, coated with a third material, and the second material is removed to reveal the desired image. Another significant patent he holds is related to headlamp technology, showcasing his versatility in different applications.
Career Highlights
Throughout his career, Dirk-Martin has worked with prominent companies such as Valeo Sylvania LLC and Osram Sylvania Inc. His experience in these organizations has contributed to his expertise and innovative approach in the field.
Collaborations
Dirk-Martin has collaborated with notable coworkers, including David D. Egly and Robert L. King, which has further enriched his professional journey.
Conclusion
Dirk-Martin Skirha, III is a distinguished inventor whose work in molding technology has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to enhancing manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
