Kuurne, Belgium

Dirk Maes

This inventor holds 1 USPTO granted patent. Top assignee: Barco Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dirk Maes. Retrieved from https://idiyas.com/inventor/dirk-maes-40d002ts

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Dirk Maes - Innovator in Display Technology

Introduction

Dirk Maes is a notable inventor based in Kuurne, Belgium. He has made significant contributions to the field of display technology, particularly through his innovative patent that addresses challenges in immersive display systems.

Latest Patents

Dirk Maes holds a patent for "Display systems and methods employing screens with an array of micro-lenses or micro-mirrors." This immersive display system is designed to mitigate the reduction in contrast ratio caused by peripheral light. The system includes screens with an array of micro-lenses, a light polarization layer, a polarization rotation layer, a light reflection layer, and a section of non-polarizing light scattering material. This configuration allows for effective light management, enhancing the overall viewing experience.

Career Highlights

Dirk Maes is associated with Barco Limited, a company renowned for its advanced visualization and collaboration solutions. His work at Barco has positioned him as a key player in the development of cutting-edge display technologies.

Collaborations

Dirk collaborates with talented individuals such as Patrick Candry and Bart Maximus, contributing to innovative projects within the company.

Conclusion

Dirk Maes exemplifies the spirit of innovation in display technology, with his patent reflecting a commitment to enhancing visual experiences. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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