Dirk Leinenbach

Title: Dirk Leinenbach: Innovator in Exposure Technology

Introduction

Dirk Leinenbach is a notable inventor based in Habach, Germany. He has made significant contributions to the field of exposure technology, particularly in the production of exposed structures on various components. His innovative approach has led to the development of a unique method that enhances efficiency in manufacturing processes.

Latest Patents

Dirk Leinenbach holds a patent for a "Method and device for producing exposed structures." This invention aims to improve the efficiency of producing identical structures on multiple components using an exposure unit. The method involves moving the substrate member and the exposure unit relative to one another, allowing for the simultaneous exposure of all components along a path. The exposure unit is equipped with multiple light sources and a control system that optimizes the exposure process.

Career Highlights

Leinenbach is associated with Kleo Halbleitertechnik GmbH & Co. KG, where he applies his expertise in exposure technology. His work has been instrumental in advancing the capabilities of the company in the semiconductor industry. With a focus on innovation, he continues to push the boundaries of what is possible in his field.

Collaborations

Dirk collaborates with talented individuals such as Hans Opower and Stefan Scharl. Together, they work on various projects that aim to enhance the efficiency and effectiveness of exposure technologies.

Conclusion

Dirk Leinenbach's contributions to exposure technology exemplify the spirit of innovation. His patent and collaborative efforts reflect a commitment to advancing manufacturing processes. Through his work, he continues to influence the industry positively.