HAMBURG, Germany

Dirk Fritsche

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Airbus Operations Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dirk Fritsche. Retrieved from https://idiyas.com/inventor/dirk-fritsche

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Dirk Fritsche - Innovator in Aircraft Design

Introduction: Dirk Fritsche is an accomplished inventor based in Hamburg, Germany. He is currently employed at Airbus Operations GmbH, where he contributes to advancements in aircraft design. Although he has not yet been granted any patents, his work is focused on innovative solutions for the aviation industry.

Latest Patent Applications: Dirk Fritsche has submitted several patent applications that showcase his inventive capabilities. One of his latest applications is titled "Transition for a Sidewall to a Monument in an Aircraft and Method of Adapting a Sidewall." This application describes a transition that includes a wall bridging the gap between the sidewall and the monument, featuring a side fitting designed to overlap with the sidewall. Another application is "Cover for a Transition from a Lining to a Monument," which details an interior aircraft section that includes a cover for the gap between a lining and a monument. This cover is designed to be securely mounted to both the monument and the lining, ensuring a seamless integration within the aircraft's interior.

Conclusion: Dirk Fritsche is a promising inventor whose work at Airbus Operations GmbH reflects his commitment to enhancing aircraft design through innovative applications. His contributions, although not yet patented, demonstrate his potential impact on the aviation industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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