Iselin, NJ, United States of America

Dinh Dang

This inventor holds 1 USPTO granted patent. Top assignee: Basf Mobile Emissions Catalysts LLC. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dinh Dang. Retrieved from https://idiyas.com/inventor/dinh-dang-qiskf2m7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Dinh Dang: Innovator in Catalytic Technology

Introduction

Dinh Dang is a notable inventor based in Iselin, NJ (US). He has made significant contributions to the field of catalytic technology, particularly in the development of layered catalysts.

Latest Patents

Dinh Dang holds a patent for a "Layered catalysts composition and catalytic article and methods of manufacturing and using the same." This invention features a layered catalytic article that includes a first layer with a nickel component and a ceria component, and a second layer comprising a platinum group metal component, an oxygen storage component, and an alumina component. The patent outlines a process for preparing this layered catalytic article and its application in exhaust systems for internal combustion engines. He has 1 patent to his name.

Career Highlights

Dinh Dang is associated with BASF Mobile Emissions Catalysts LLC, where he applies his expertise in catalytic technology. His work focuses on improving emissions control systems, which are crucial for environmental sustainability.

Collaborations

Dinh has collaborated with notable colleagues, including Xiaolai Zheng and Michel Deeba, contributing to advancements in catalytic technologies.

Conclusion

Dinh Dang's innovative work in layered catalysts showcases his commitment to enhancing catalytic processes and environmental solutions. His contributions are vital in the ongoing efforts to improve emissions control technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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