Kunshan, China

Dingai Xiang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kunshan Nano New Material Technology Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dingai Xiang. Retrieved from https://idiyas.com/inventor/dingai-xiang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: The Innovative Work of Dingai Xiang

Introduction

Dingai Xiang is an inventor based in Jiangsu, China. He has made significant contributions to the field of polishing systems, particularly through his innovative approach to utilizing non-Newtonian fluids. His work focuses on enhancing the efficiency and effectiveness of polishing processes for various workpieces.

Latest Patent Applications

Dingai Xiang has submitted a patent application titled "POLISHING SYSTEM BASED ON THE NON-NEWTON FLUID AND POLISHING METHOD THEREOF." This application describes a polishing system that includes a polishing device, a non-Newtonian fluid auxiliary device, and a control device. The polishing device is designed to move a workpiece within a polishing container filled with a non-Newtonian fluid containing abrasives that facilitate the polishing action. The non-Newtonian fluid auxiliary device can manipulate the viscosity of the fluid by adjusting pressure, speed, vibration, or ultrasonic frequency, allowing the abrasives to effectively polish the workpiece. The control device optimizes the polishing process by managing the movement of the polishing device within the container. This innovative method enables the polishing of workpieces with any three-dimensional shape.

Conclusion

Dingai Xiang's contributions to polishing technology through his patent application demonstrate his commitment to innovation in the field. His work has the potential to significantly improve polishing processes across various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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