Location History:
- Taipei, TW (2002 - 2005)
- Hsinchu, TW (2006 - 2023)
Company Filing History:
4 out of 9,152 
3 out of 40,780 
Years Active: 2002-2023
Title: Ding-Wei Huang: A Pioneer in Layout Diagram Innovations
Introduction
Ding-Wei Huang is a distinguished inventor located in Hsinchu, Taiwan, known for his contributions to the field of layout diagram generation. With a remarkable portfolio that includes seven patents, Huang has made significant strides in enhancing the efficiency and precision of layout designs in various applications.
Latest Patents
Huang's latest patents showcase innovative methods for generating layout diagrams. One of his notable inventions involves a method that identifies a group of three or more cells arranged to exhibit multiple edge-pairs (EPs). This method selectively moves cells to create minimum gaps between the EP members, improving the layout's practicality.
Another recent patent focuses on addressing violations of horizontal constraint vectors (HCV) by identifying groups of cells that exhibit vertically-aligned edge-pairs (VEPs). By strategically adjusting cell positions, Huang’s method ensures compliance with separation thresholds, thereby enhancing the overall layout design.
Career Highlights
Throughout his career, Ding-Wei Huang has worked with renowned organizations such as the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company Limited. His experiences at these institutions have allowed him to refine his skills and contribute significantly to advancements in layout design technology.
Collaborations
Huang's innovative journey has been complemented by collaborations with accomplished coworkers, including Tsung-Hsuan Chiu and Meng-Kai Hsu. These partnerships have fostered an environment of creativity and shared knowledge, further propelling Huang's contributions to the field.
Conclusion
Ding-Wei Huang stands out as a crucial figure in the realm of layout diagram innovations. His patented methods not only enhance existing technologies but also pave the way for future developments in the industry. His dedication to improving design efficiency continues to inspire and influence upcoming generations of inventors and engineers.