Sunnyvale, CA, United States of America

Dileep Venkata Sai Vadladi

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dileep Venkata Sai Vadladi. Retrieved from https://idiyas.com/inventor/dileep-venkata-sai-vadladi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Dileep Venkata Sai Vadladi: Innovator in Semiconductor Processing

Introduction

Dileep Venkata Sai Vadladi is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of semiconductor processing, particularly in enhancing plasma uniformity.

Latest Patents

Dileep holds a patent titled "Apparatus to improve process non-uniformity for semiconductor direct plasma processing." This invention relates to high-efficiency inductively coupled plasma sources and plasma processing apparatus. The patent describes a plasma processing apparatus that includes a processing chamber, a substrate support, a grid support, and a grid. The grid is designed with a plurality of holes and outer openings to facilitate the flow of plasma towards the substrate support, thereby improving plasma uniformity.

Career Highlights

Dileep is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing innovative solutions that enhance the efficiency of plasma processing technologies.

Collaborations

Dileep has collaborated with notable colleagues such as Wei Liu and Rene George, contributing to advancements in semiconductor technology.

Conclusion

Dileep Venkata Sai Vadladi is a prominent inventor whose work in semiconductor processing has the potential to significantly impact the industry. His innovative patent demonstrates his commitment to improving technology in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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