Walsrode, Germany

Dietrich Stockmeier

This inventor holds 1 USPTO granted patent. Top assignee: Wolff Walsrode Ag. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dietrich Stockmeier. Retrieved from https://idiyas.com/inventor/dietrich-stockmeier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Dietrich Stockmeier: Innovator in Transparent Polypropylene Film

Introduction

Dietrich Stockmeier is a notable inventor based in Walsrode, Germany. He is recognized for his contributions to the field of materials science, particularly in the development of innovative films. His work has led to advancements that are significant in various industrial applications.

Latest Patents

Stockmeier holds a patent for a transparent, stretched polypropylene film. This invention features at least monoaxially stretched polypropylene film containing an antiblocking agent. The antiblocking agent is characterized by a cuboid and/or cubic geometry, preferably cubic, with bevelled, or chamfered, edges. Additionally, it is X-ray amorphous, which enhances its utility in various applications.

Career Highlights

Throughout his career, Stockmeier has been associated with Wolff Walsrode AG, a company known for its innovative approaches in the polymer industry. His work has contributed to the company's reputation for quality and innovation in materials.

Collaborations

Stockmeier has collaborated with notable colleagues, including Hermann Hendrickson-Benkhoff and Ulrich Reiners. These partnerships have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Dietrich Stockmeier's contributions to the development of transparent polypropylene film exemplify his innovative spirit and dedication to advancing materials science. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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