Ludwigsburg, Germany

Dietmer Kammerer

This inventor holds 1 USPTO granted patent. Top assignee: Hirschmann Austria Gmbh. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dietmer Kammerer. Retrieved from https://idiyas.com/inventor/dietmer-kammerer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Dietmer Kammerer: Innovator in Connector Technology

Introduction

Dietmer Kammerer is a notable inventor based in Ludwigsburg-Poppenweiler, Germany. He has made significant contributions to the field of connector technology, particularly with his innovative designs that enhance functionality and usability.

Latest Patents

Kammerer holds a patent for a symmetrical connector. This invention features a contact carrier with multiple receiving areas for contact partners. It also includes a contact carrier sleeve that can be moved over the contact carrier and fixed in place. The design incorporates a catch device for locking the connector to a mating connector. The symmetrical nature of the contact carrier and sleeve allows for versatile positioning, enabling the sleeve to be moved into various positions and securely fixed.

Career Highlights

Dietmer Kammerer is associated with Hirschmann Austria GmbH, where he applies his expertise in connector technology. His work has contributed to advancements in the industry, showcasing his commitment to innovation and quality.

Collaborations

Kammerer collaborates with Thomas Bürk, leveraging their combined knowledge and skills to drive forward the development of new technologies in their field.

Conclusion

Dietmer Kammerer is a distinguished inventor whose work in connector technology exemplifies innovation and practical design. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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