Location History:
- Munich, DE (1978)
- Groebenzell, DE (1988)
Company Filing History:
Years Active: 1978-1988
Title: Dieter Pawlik: Innovator in Silicon Technology
Introduction
Dieter Pawlik is a notable inventor based in Munich, Germany. He has made significant contributions to the field of silicon technology, holding 2 patents that showcase his innovative approaches to manufacturing silicon layers.
Latest Patents
His latest patents include a method for the manufacture of silicon oxide layers doped with boron. This method involves positioning silicon wafers in a reaction chamber where tetraethylorthosilicate, trimethylborate, and a phosphorus source are introduced. The reactants are decomposed at a temperature of at least 600°C and at a substantially subatmospheric pressure to deposit silicon dioxide doped with boron and phosphorus onto the wafers. Another patent focuses on a process for the production of epitaxial layers on a monocrystalline substrate. This method involves moving a melt on the substrate's surface, depositing the layer, and removing the remaining melt, ensuring that no portion of the melt is retained after forming the layer.
Career Highlights
Dieter Pawlik is currently employed at Siemens Aktiengesellschaft, where he continues to push the boundaries of silicon technology. His work has been instrumental in advancing methods that enhance the quality and efficiency of silicon layer production.
Collaborations
He has collaborated with notable colleagues such as Frank S Becker and Karl-Heinz Zschauer, contributing to a dynamic work environment that fosters innovation.
Conclusion
Dieter Pawlik's contributions to silicon technology through his patents and work at Siemens Aktiengesellschaft highlight his role as a key innovator in the field. His advancements in manufacturing processes are paving the way for future developments in silicon applications.