This inventor holds 4 USPTO granted patents. Top assignee: Stauffer Chemical Company. Active years: 1986-1993.
Company Filing History:
Years Active: 1986-1993
Title: **Innovative Contributions of Diego J Olego in III-V Semiconductor Technology**
Introduction
Diego J Olego, an accomplished inventor based in Croton-on-Hudson, NY, has made significant advancements in the field of semiconductor technology. With four patents to his name, Olego specializes in the development of advanced materials that enhance electronic and opto-electronic devices.
Latest Patents
His latest patents focus on the passivation and insulation of III-V devices using pnictides, particularly phosphorus thin films. These amorphous thin films exhibit a unique layer-like, puckered sheet-like local order and are generally 400 Angstroms thick. They are primarily grown using molecular beam deposition, along with alternative methods such as vacuum evaporation and chemical vapor deposition. The pnictide layers not only reduce the density of surface states but also enable the modulation of the depletion layer, reduction of the surface barrier, and an increase in electron concentration at the surface. The innovations allow for improved performance in various devices including light-emitting diodes, lasers, and solar cells.
Career Highlights
Diego J Olego is associated with Stauffer Chemical Company, a leader in specialty and fine chemicals. His research has had a profound impact on the efficiency and functionality of semiconductor devices and has positioned him as a pioneering figure in this technical domain.
Collaborations
Throughout his career, Olego has worked alongside esteemed colleagues such as John A Baumann and Rozalie Schachter. Their collaborative efforts have facilitated remarkable advancements in semiconductor technology and contributed to the broader scientific community.
Conclusion
Diego J Olego's innovative work in the area of III-V semiconductor devices demonstrates the importance of continued research and development in enhancing electronic performance. His dedication to the field and collaboration with notable peers underscore his significant contributions to modern technology.