Kuesnacht, Switzerland

Didier Lootens

This inventor holds 20 USPTO granted patents and 14 published patent applications, plus 2 CIPO patents and 20 EPO patents, primarily in 3D Printing Materials. Top assignee: Sika Technology Ag. Active years: 2012-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Didier Lootens. Retrieved from https://idiyas.com/inventor/didier-lootens

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 95.0

 

 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Zurich, CH (2012)
  • Küsnacht, CH (2021 - 2022)
  • Küssnacht, CH (2021 - 2024)

Company Filing History:


Years Active: 2012-2026

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Areas of Expertise:
3D Printing
Polyurethane Composition
Mineral Binder
Additive Manufacturing
Building Material
Accelerator Powder
Cementitious Adhesive
Shrinkage Reducer
Mixer System
Tile Adhesive
Dynamic Elastic Modulus
Multi-Component Mortar
20 patents (USPTO):Explore Patents

Title: Inventor Didier Lootens: Revolutionizing Technology in Küsnacht

Introduction: Didier Lootens is a visionary inventor based in Küsnacht, Switzerland, known for his groundbreaking contributions to the field of technology.

Latest Patents: Didier Lootens holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, Didier Lootens has worked with leading tech companies to develop cutting-edge solutions that have had a significant impact on various industries.

Collaborations: Throughout his career, Didier Lootens has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Inventor Didier Lootens continues to push the boundaries of technology, inspiring the next generation of inventors and leaving a lasting legacy in the world of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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