Montpellier, France

Didier Alberny-Sicard

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Illinois Tool Works Inc.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Didier Alberny-Sicard. Retrieved from https://idiyas.com/inventor/didier-alberny-sicard

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Didier Alberny-Sicard

Introduction

Didier Alberny-Sicard is a notable inventor based in Montpellier, France. He has made significant contributions to the field of data mediums, particularly through his innovative patent. His work exemplifies the intersection of technology and security in data production.

Latest Patents

One of Didier's key patents is titled "Method for the production of a multi-layer data medium with security inscriptions." This patent discloses a method for creating a multi-layer data medium by hot rolling under pressure a plurality of superimposed layers that feature security inscriptions. The process involves marking rolling on at least one layer covered with a marking film that bears inscriptions in vitrophany. This film is applied in contact with the layer to be marked, and after the marking process, the film is separated, leaving the layer with the security inscriptions intact. This innovative approach enhances the security and integrity of data mediums.

Career Highlights

Throughout his career, Didier has worked with prominent companies, including Illinois Tool Works Inc. and Fasver. His experience in these organizations has contributed to his expertise in the field of data security and production methods.

Collaborations

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Conclusion

Didier Alberny-Sicard's contributions to the field of data mediums through his innovative patent demonstrate his commitment to enhancing security in technology. His work continues to influence the industry and showcases the importance of innovation in data production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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