Company Filing History:
Years Active: 2000
Title: Dick N Anderson: Innovator in Metal-Barrier Structures
Introduction
Dick N Anderson is a notable inventor based in Plano, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of metal-barrier structures. His innovative work has led to advancements that enhance the performance and stability of electronic devices.
Latest Patents
Anderson holds a patent for a "Stable and low resistance metal/barrier/silicon stack structure." This invention includes a metal-poly stack gate structure and an associated method for forming a conductive barrier layer between tungsten (W) and poly in the metal-gate stack gate structure. The process involves several steps, including depositing doped silicon on a substrate, forming nitride on the deposited silicon, and depositing a metal on the nitride to create a metal/nitride/deposited silicon stack. The thermal treatment of this stack transforms the nitride layer into a conductive barrier, which plays a crucial role in preventing reactions between W and silicon, enhancing sheet resistance, and improving adhesion between the W and poly. This barrier is also stable at high temperatures, making it a valuable innovation in the semiconductor industry.
Career Highlights
Anderson is associated with Texas Instruments Corporation, where he has contributed to various projects and innovations. His work has been instrumental in advancing the company's technology and maintaining its competitive edge in the market.
Collaborations
Anderson has collaborated with notable colleagues, including Jiong-Ping Lu and Ming J Hwang. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.
Conclusion
Dick N Anderson's contributions to the field of semiconductor technology, particularly through his patent on metal-barrier structures, highlight his role as an influential inventor. His work continues to impact the industry positively, showcasing the importance of innovation in technology.