Company Filing History:
Years Active: 2001-2005
Title: Dianne L Sundling: Innovator in Lithographic Metrology
Introduction
Dianne L Sundling is a prominent inventor based in Huntington, Vermont, known for her significant contributions to the field of lithographic metrology. With a total of 3 patents, she has developed innovative methods that enhance the precision and stability of semiconductor manufacturing processes.
Latest Patents
One of her latest patents is titled "Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus." This method employs three-dimensional feature metrology to implement critical image control and feedback of lithographic focus and x/y tilt. It focuses on measuring three-dimensional profile changes in a photo-sensitive film and provides compensatory exposure tool focus corrections to maintain a stable lithographic process. The method monitors focus changes from the optimal tool focus offset directly on critical product images for both contact hole and line images. Z focus corrections and x/y tilt corrections are fed back independently of dose to maintain critical dimension (CD) control, thereby achieving improved semiconductor wafer printing. Additionally, this method can diagnose problems with the focusing system by measuring the relationship between line edge width and barometric pressure.
Career Highlights
Dianne is currently associated with the International Business Machines Corporation (IBM), where she continues to push the boundaries of innovation in her field. Her work has been instrumental in advancing lithographic techniques that are crucial for modern semiconductor manufacturing.
Collaborations
Throughout her career, Dianne has collaborated with notable colleagues, including Reginald R Bowley, Jr and Vincent J Carlos. These collaborations have further enriched her research and development efforts.
Conclusion
Dianne L Sundling's contributions to lithographic metrology exemplify her commitment to innovation and excellence in the semiconductor industry. Her patents reflect a deep understanding of the complexities involved in lithographic processes, making her a valuable asset to her field.