Greenwich, CT, United States of America

Diane Madfes

This inventor holds 1 USPTO granted patent. Top assignee: Healing Skin LLC. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Diane Madfes. Retrieved from https://idiyas.com/inventor/diane-madfes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Diane Madfes: Innovator in Burn Treatment Solutions

Introduction

Diane Madfes is a notable inventor based in Greenwich, CT (US). She has made significant contributions to the field of burn treatment through her innovative methods and compositions. Her work focuses on improving the healing process for individuals suffering from topical burns.

Latest Patents

Diane holds a patent for a burn treatment composition and method. This invention is directed to a method for treating topical burns with compositions that include a silicone-containing compound, a Vitamin E compound, and a local anesthetic. This unique combination aims to enhance the healing process and provide relief to patients.

Career Highlights

Diane is associated with Healing Skin LLC, where she continues to develop and refine her innovative solutions for skin treatment. Her dedication to improving patient care through her inventions has established her as a respected figure in her field.

Collaborations

Diane has worked alongside talented individuals such as Wanda Fontaine and Irwin Palefsky. Their collaborative efforts contribute to the advancement of skin treatment technologies.

Conclusion

Diane Madfes exemplifies innovation in the medical field, particularly in burn treatment solutions. Her contributions are paving the way for improved healing methods and patient care.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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