This inventor holds 2 USPTO granted patents, plus 1 CIPO patent. Top assignee: Dow Corning Corporation. Active years: 1988-1990.
Company Filing History:
Years Active: 1988-1990
Title: The Innovations of Diane M Rasch
Introduction
Diane M Rasch is a notable inventor based in Alameda, CA (US), recognized for her contributions to the field of organosiloxane technology. With a total of 2 patents, she has made significant advancements in materials that exhibit thermal stability and utility in semiconductor applications.
Latest Patents
One of her latest patents is for a thermally stable fluorinated organosiloxane gel composition. This innovation allows for the preparation of polyorganosiloxane gels that resist discoloration, hardening, and surface deformation at temperatures of 100 degrees Celsius and above. The composition involves curing a polydiorganosiloxane containing silicon-bonded fluorinated hydrocarbon radicals and an organohydrogensiloxane with at least three silicon-bonded hydrogen atoms per molecule, using a platinum-containing catalyst and a small amount of copper acetylacetonate.
Another significant patent is for screen printable organosiloxane resin coating compositions. These thixotropic, silica-filled coating compositions utilize a liquid polydiorganosiloxane containing hydroxyl-terminated polyoxypropylene units as a flow control agent. This innovation is particularly useful as a passivation coating for semiconductor devices, enhancing their performance and reliability.
Career Highlights
Diane has worked with prominent companies such as Dow Corning Corporation and Lawrence D. Fiedler, where she has honed her expertise in materials science and engineering. Her work has contributed to the development of advanced materials that are crucial in various industrial applications.
Collaborations
Throughout her career, Diane has collaborated with notable professionals in her field, including Robert C Antonen and David A Sierawski. These collaborations have further enriched her research and development efforts.
Conclusion
Diane M Rasch's innovative work in organosiloxane technology has led to significant advancements in materials that are essential for modern applications. Her contributions continue to impact the industry positively, showcasing her role as a leading inventor in her field.