Diana K Dunn

Title: Diana K Dunn: Innovator in Si-O Containing Coatings

Introduction

Diana K Dunn is a prominent inventor based in Midland, MI (US). She has made significant contributions to the field of electronic substrates through her innovative methods and materials. With a total of 3 patents, Dunn has established herself as a key figure in her industry.

Latest Patents

Diana K Dunn's latest patents include a method for forming Si-O containing coatings. This method involves heating a hydrogen silsesquioxane resin successively under wet ammonia, dry ammonia, and oxygen. The resultant coatings exhibit improved properties, such as low dielectric constants. Another notable patent focuses on low dielectric constant coatings, which are Si-O containing ceramics that maintain a dielectric constant of less than or equal to about 3.2 over time. These advancements make the ceramics particularly valuable for use on electronic substrates.

Career Highlights

Diana K Dunn is associated with Dow Corning Corporation, where she has been instrumental in developing innovative materials for electronic applications. Her work has not only advanced the technology but has also contributed to the company's reputation as a leader in the field.

Collaborations

Dunn has collaborated with notable coworkers, including Robert Charles Camilletti and David S Ballance. Their combined expertise has fostered a productive environment for innovation and development.

Conclusion

Diana K Dunn's contributions to the field of Si-O containing coatings have made a significant impact on electronic substrates. Her innovative methods and collaborative spirit continue to drive advancements in technology.