The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 1995
Filed:
Sep. 22, 1993
Applicant:
Inventors:
David S Ballance, Midland, MI (US);
Robert C Camilletti, Midland, MI (US);
Diana K Dunn, Midland, MI (US);
Assignee:
Dow Corning Corporation, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427228 ; 427377 ; 427387 ; 4273977 ; 427579 ; 428688 ; 437238 ;
Abstract
Disclosed is a method for forming improved Si--0 containing coatings on electronic substrate. The method comprises treating Si--0 containing ceramic coatings derived from hydrogen silsesquioxane resin with hydrogen gas. The resultant coatings have improved properties such as stable dielectric constants.
Ballance, David. (1995). Method of forming si-o containing coatings (U.S. Patent No. 5441765). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5441765
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile