Company Filing History:
Years Active: 2024
Title: The Innovative Contributions of Di Sang
Introduction
Di Sang is a notable inventor based in Sichuan, China. He has made significant contributions to the field of photolithography through his innovative patent. His work focuses on optimizing mask topology for surface plasmon near-field photolithography, which is crucial for advancing imaging technologies.
Latest Patents
Di Sang holds a patent titled "Mask topology optimization method and system for surface plasmon near-field photolithography." This patent describes a method that includes acquiring first mask data, performing fuzzy processing and projection processing to obtain second mask data, and conducting forward calculations based on this data. The process involves calculating imaging errors, performing adjoint calculations, and updating the first mask data iteratively until optimized mask data is achieved. This innovative approach enhances the efficiency and accuracy of photolithography techniques.
Career Highlights
Di Sang is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced imaging technologies. His expertise in mask topology optimization has positioned him as a key figure in the field. With a total of 1 patent, he continues to contribute to the scientific community through his innovative work.
Collaborations
Di Sang collaborates with esteemed colleagues such as Xiangang Luo and Mingfeng Xu. Their combined efforts in research and development have furthered advancements in photolithography and related technologies.
Conclusion
Di Sang's contributions to the field of photolithography through his innovative patent demonstrate his commitment to advancing technology. His work not only enhances imaging techniques but also reflects the collaborative spirit of scientific research.