Heilongjiang, China

Di Chang

This inventor holds 1 USPTO granted patent. Top assignee: Harbin Institute of Technology. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Di Chang. Retrieved from https://idiyas.com/inventor/di-chang-mjta57oa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Di Chang: Innovator in Heterodyne Grating Interferometry

Introduction

Di Chang is a prominent inventor based in Heilongjiang, China. He has made significant contributions to the field of interferometry, particularly through his innovative patent that enhances measurement accuracy and tolerance.

Latest Patents

Di Chang holds a patent for a "Heterodyne grating interferometric method and system for two-degree-of-freedom with high alignment tolerance." This invention relates to a method and system that utilizes a separately modulated heterodyne laser, an optical prism, and a photoelectric detection and signal processing unit. The system is designed to improve the angular tolerance of tip and tilt of the optical grating while increasing the fold factors. The method allows for precise calculations of horizontal and vertical displacement of the grating, making it a valuable advancement in the field.

Career Highlights

Di Chang is affiliated with the Harbin Institute of Technology, where he continues to engage in research and development. His work has garnered attention for its practical applications in various scientific and engineering fields.

Collaborations

Di Chang has collaborated with notable colleagues, including Pengcheng Hu and Jiubin Tan. Their combined expertise contributes to the advancement of technology in their respective areas of research.

Conclusion

Di Chang's innovative work in heterodyne grating interferometry exemplifies the impact of dedicated research and development in advancing measurement technologies. His contributions are significant in enhancing the precision and reliability of optical measurements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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