This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.
Company Filing History:
1 out of 834,411 Years Active: 2004
Title: Dhirendra Prasad Mathur: Innovator in Lithography Technology
Introduction
Dhirendra Prasad Mathur is a notable inventor based in Monroe, CT (US). He has made significant contributions to the field of lithography, particularly through his innovative patent that addresses challenges in extreme ultraviolet (EUV) technology. His work is essential for advancing the capabilities of modern lithographic processes.
Latest Patents
Dhirendra Prasad Mathur holds a patent for an "Integrated cooling substrate for extreme ultraviolet reticle." This invention provides a method and apparatus that minimizes the destructive effects of non-reflected energy during lithography. More specifically, the cooling system is located within the mask. In one example, a cooling module is integrated into the EUV mask, which may be thermoelectric. The EUV mask comprises a substrate structure as a base for a reticle, a cooling layer formed on the substrate structure, and a planarizing layer deposited on the cooling layer. In another example, a cooling channel is formed within the mask.
Career Highlights
Throughout his career, Dhirendra Prasad Mathur has focused on innovations that enhance lithographic technology. His work has been instrumental in improving the efficiency and effectiveness of EUV lithography, which is crucial for the semiconductor industry.
Collaborations
Dhirendra has collaborated with various professionals in his field, including his coworker, Michael James Lercel. Their joint efforts have contributed to advancements in lithography technology.
Conclusion
Dhirendra Prasad Mathur is a key figure in the development of innovative solutions for lithography challenges. His patent for an integrated cooling substrate demonstrates his commitment to enhancing the efficiency of EUV technology. His contributions continue to impact the semiconductor industry positively.