Pune, India

Dhanashree Havele

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Behr Process Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dhanashree Havele. Retrieved from https://idiyas.com/inventor/dhanashree-havele

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Dhanashree Havele - Innovator in Peelable Paint Technology.

Introduction

Dhanashree Havele is an innovative inventor based in India. He has made significant contributions to the field of architectural coatings. His work focuses on developing advanced materials that enhance the functionality and aesthetics of surfaces.

Latest Patents

Dhanashree Havele holds a patent for "A Water Based Peelable Paint For Architecture Coatings." This peelable paint composition is designed to form a removable coating on various substrates. The formulation includes water, a polysiloxane resin, and a film-forming resin, which consists of components such as styrene-butadiene copolymer and polyvinyl butyral.

Career Highlights

Throughout his career, Dhanashree has demonstrated a commitment to innovation in the coatings industry. His work has focused on creating environmentally friendly products that meet the needs of modern architecture. Despite having 1 patents, his contributions to the field are noteworthy.

Collaborations

Dhanashree Havele has collaborated with notable professionals in his field, including Chenming Xue and Gregory A Williams. These partnerships have allowed him to expand his research and development efforts.

Conclusion

Dhanashree Havele is a promising inventor whose work in peelable paint technology showcases his innovative spirit. His contributions to architectural coatings reflect a dedication to advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…