Beijing, China

Dezhe Nan

This inventor holds 1 USPTO granted patent. Top assignee: Beijing Gungyao Electricity Equipment Co. Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dezhe Nan. Retrieved from https://idiyas.com/inventor/dezhe-nan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Dezhe Nan: Innovator in Plasma Technology

Introduction

Dezhe Nan is a prominent inventor based in Beijing, China. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and methods. His work focuses on enhancing the efficiency and longevity of plasma ejection systems.

Latest Patents

Dezhe Nan holds a patent for an AC plasma ejection gun, along with a method for supplying power to it and a pulverized coal burner. This invention features a unique design that includes a front electrode and a rear electrode, with a gap between them. The ejection gun is capable of operating with a small current while delivering large power, which extends the lifespan of the plasma ejection gun.

Career Highlights

Dezhe Nan is associated with Beijing Gungyao Electricity Equipment Co. Ltd., where he applies his expertise in electrical equipment and plasma technology. His innovative approach has positioned him as a key figure in the development of advanced energy solutions.

Collaborations

Dezhe Nan has worked alongside notable colleagues, including Hujun Zhao and Jian Li. Their collaborative efforts have contributed to the advancement of technologies in their field.

Conclusion

Dezhe Nan's contributions to plasma technology through his patent and work at Beijing Gungyao Electricity Equipment Co. Ltd. highlight his role as an influential inventor. His innovations continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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