Deyang Li

Title: Deyang Li - Innovator in Semiconductor Processing

Introduction

Deyang Li is a notable inventor based in Santa Clara, CA, specializing in semiconductor device manufacturing processes. With a focus on improving plasma processing methods, Li has made significant contributions to the field.

Latest Patents

Deyang Li holds a patent titled "Reducing aspect ratio dependent etch with direct current bias pulsing." This invention relates to a system used in semiconductor device manufacturing. The patent describes apparatus and methods for synchronizing and controlling the delivery of an RF bias signal and a pulsed voltage waveform to electrodes within a plasma processing chamber. The technology aims to minimize or eliminate the microloading effect that occurs while processing small dimension features with varying densities across a substrate. By improving the control of plasma characteristics and ion energy distribution, this invention enhances the precision of plasma processing, particularly in forming high-aspect ratio features through reactive ion etching.

Career Highlights

Deyang Li is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing technologies that improve manufacturing processes and device performance.

Collaborations

Li collaborates with talented professionals in his field, including Sunil Srinivasan and Yi-Chuan Chou, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Deyang Li's contributions to semiconductor processing through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovations continue to drive advancements in semiconductor manufacturing processes.