Location History:
- Wenham, MA (US) (2009)
- Middleton, MA (US) (2014)
Company Filing History:
Years Active: 2009-2014
Title: Innovations by Deven M Raj in Plasma Processing Technology
Introduction
Deven M Raj is a notable inventor based in Middleton, MA (US), recognized for his contributions to plasma processing technology. He holds 2 patents that focus on improving the efficiency and repeatability of plasma processes. His work has significant implications for various applications in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Closed loop process control of plasma processed materials." This invention discloses a plasma processing apparatus and method that enhance the repeatability of various plasma processes. The method utilizes current implant conditions and historical data to improve the consistency of the implanted dose. In this embodiment, a plasma is generated, and two sensing systems monitor the plasma composition and the total number of ions implanted. The information gathered is used to control operating parameters in the plasma chamber, ensuring optimal performance.
Another significant patent by Deven M Raj is "Closed loop control and process optimization in plasma doping processes using a time of flight ion detector." This method involves controlling a plasma doping process by generating a plasma with dopant ions in a chamber. A time-of-flight ion detector measures the spectrum of ions present, while a Faraday dosimetry system quantifies the total number of ions impacting the substrate. The integrated dose is calculated, and plasma doping parameters are modified accordingly to achieve desired outcomes.
Career Highlights
Deven M Raj is currently employed at Varian Semiconductor Equipment Associates, Inc., where he applies his expertise in plasma processing. His innovative approaches have contributed to advancements in the field, particularly in enhancing the precision of plasma doping techniques.
Collaborations
Throughout his career, Deven has collaborated with notable professionals, including George D Papasouliotis and Ludovic Godet. These collaborations have fostered a productive environment for innovation and development in plasma technology.
Conclusion
Deven M Raj's work in plasma processing technology exemplifies the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to improving process efficiency and repeatability, which are crucial for advancing manufacturing techniques.