Hamburg, Germany

Detlef Oelgeschlager

This inventor holds 1 USPTO granted patent. Top assignee: Nxp B.v.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Detlef Oelgeschlager. Retrieved from https://idiyas.com/inventor/detlef-oelgeschlager

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Detlef Oelgeschlager: Innovator in Semiconductor Technology

Introduction

Detlef Oelgeschlager is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Detlef Oelgeschlager holds a patent for a "Semiconductor device with multilayer contact and method of manufacturing the same." This invention provides a semiconductor with a multilayered contact structure. The multilayered structure includes a metal contact placed on an active region of a semiconductor and a metal contact extension placed on the metal contact. He has 1 patent to his name.

Career Highlights

Detlef Oelgeschlager is currently associated with NXP B.V., a leading company in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving device performance.

Collaborations

Detlef has collaborated with notable colleagues, including Soenke Habenicht and Olrik Schumacher, contributing to various projects within the semiconductor field.

Conclusion

Detlef Oelgeschlager's innovative work in semiconductor technology exemplifies the impact of dedicated inventors in advancing modern electronics. His contributions continue to shape the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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