Desmond Cheung

Title: The Innovations of Desmond Cheung

Introduction

Desmond Cheung is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of image sensors. With a total of 4 patents to his name, Cheung continues to push the boundaries of innovation in his industry.

Latest Patents

Cheung's latest patents include a CMOS image sensor and a method of forming the same. This complementary metal-oxide-semiconductor (CMOS) image sensor features an implant region of a second type formed in a crystalline layer of a first type. A channel of a transfer gate entirely covers the implant region, which partially joins a photodiode, a doped well, and a floating diffusion node. Another significant patent involves a process of forming a semiconductor device, which includes second-type blanket implanting a first-type semiconductor substrate to create a second-type implant layer. This process also involves second-type implanting the semiconductor substrate through a first mask to form second-type wells and first-type implanting through a second mask to create isolations.

Career Highlights

Desmond Cheung is currently employed at Himax Imaging, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of imaging devices, making them more efficient and effective.

Collaborations

Cheung has collaborated with talented individuals in his field, including Yang Wu and Kihong Kim. These partnerships have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Desmond Cheung's contributions to the field of semiconductor technology and his innovative patents highlight his role as a leading inventor. His work continues to influence the industry and pave the way for future advancements.