Lawrence, KS, United States of America

Derick Schweppe

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Derick Schweppe. Retrieved from https://idiyas.com/inventor/derick-schweppe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Derick Schweppe: Innovator in Stamping Technology

Introduction

Derick Schweppe is a notable inventor based in Lawrence, Kansas. He has made significant contributions to the field of stamping technology. With a focus on innovation, he has developed a unique patent that showcases his expertise and creativity.

Latest Patents

Derick holds a patent for a Stamping Device. This invention reflects his commitment to enhancing manufacturing processes and improving efficiency in stamping applications. His innovative approach has the potential to impact various industries that rely on stamping technology.

Career Highlights

Throughout his career, Derick has demonstrated a strong dedication to his work. His patent is a testament to his skills and knowledge in the field. He continues to explore new ideas and technologies that can further advance the industry.

Collaborations

Derick has worked alongside Regina Yoder, contributing to a collaborative environment that fosters innovation. Their partnership highlights the importance of teamwork in the development of new technologies.

Conclusion

Derick Schweppe is an accomplished inventor whose work in stamping technology is noteworthy. His patent for the Stamping Device exemplifies his innovative spirit and dedication to improving manufacturing processes. His contributions will undoubtedly leave a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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