Leidschendam, Netherlands

Dennis Van Weeren


 

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Leidschendam, NL (2021 - 2022)
  • Nieuw, NL (2022)
  • Nieuw Vennep, NL (2022 - 2024)

Company Filing History:


Years Active: 2021-2025

Loading Chart...
Loading Chart...
8 patents (USPTO):Explore Patents

Title: Innovations of Dennis Van Weeren

Introduction

Dennis Van Weeren is a notable inventor based in Leidschendam, Netherlands. He has made significant contributions to the field of technology, holding a total of 8 patents. His work primarily focuses on systems and methods that enhance monitoring and measurement capabilities in various applications.

Latest Patents

Among his latest patents is an "Apparatus, method and system for measuring locations on an object." This innovative system is designed for monitoring survey reflectors arranged at multiple locations on an object. The processing unit within the system is configured to determine the locations of the survey reflectors from image sensor data and detect any movement of the reflectors by comparing the determined locations with previously established ones.

Another significant patent is related to the "Position monitoring of a gasket between tunnel segments." This invention involves a method and sensor system for monitoring the geometric properties of a gasket that seals two structural members of a subterranean or immersed tunnel. The system includes a sensor that measures position indications for surface portions of the gasket relative to a reference associated with one or both structural members. The processor connected to the sensor derives indications of displacement for each gasket surface portion and generates a warning message for an operator if any displacement exceeds a predetermined threshold.

Career Highlights

Dennis Van Weeren is currently associated with FNV IP B.V., where he continues to innovate and develop new technologies. His expertise in measurement and monitoring systems has positioned him as a valuable contributor in his field.

Collaborations

He has collaborated with notable colleagues such as Arnoud Marc Jongsma and Joachim Ulrich Seibert, further enhancing the innovative environment in which he works.

Conclusion

Dennis Van Weeren's contributions to technology through his patents reflect his commitment to innovation and excellence. His work continues to impact various industries, showcasing the importance of advancements in measurement and monitoring systems.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…