Long Valley, NJ, United States of America

Dennis R Stucky

This inventor holds 1 USPTO granted patent. Top assignee: Aventa Technologies, Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dennis R Stucky. Retrieved from https://idiyas.com/inventor/dennis-r-stucky

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Dennis R Stucky

Introduction

Dennis R Stucky is an inventive mind based in Long Valley, NJ, who has made notable advancements in the field of chemical vapor deposition systems. His expertise in creating specialized apparatus has led to patented innovations that enhance manufacturing processes in various industries.

Latest Patents

Stucky holds a patent for a "Showerhead apparatus for a linear batch chemical vapor deposition system." This innovative design features a movable showerhead, multiple gas supply conduits, and a translation mechanism that collectively improve the efficiency of depositing precursor gases onto substrates. The arrangement of conduits and channels in the showerhead ensures optimal distribution of gases, leading to reduced parasitic deposition and enhanced thickness uniformity of the deposited layers.

Career Highlights

His work at Aventa Technologies, Inc. showcases his dedication to advancing technology within the realm of chemical processing. Stucky's patented invention has significant implications for improving device yield and ensuring consistency in product quality—a critical factor in high-tech manufacturing.

Collaborations

Throughout his innovative career, Stucky has collaborated with fellow experts Piero Sferlazzo and Paul Thomas Fabiano. Together, they strive to further enhance and refine technologies that push the boundaries of current manufacturing capabilities.

Conclusion

Dennis R Stucky's contributions to the field of chemical vapor deposition signify the importance of innovation in manufacturing processes. Through his patented showerhead apparatus, he continues to influence advancements in technology and improve the efficiency of production systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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