Corinth, VT, United States of America

Dennis Kulakowski

USPTO Granted Patents = 2 


Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Dennis Kulakowski: Innovator in Plasma Arc Technology

Introduction

Dennis Kulakowski is a notable inventor based in Corinth, Vermont, who has made significant contributions to the field of plasma arc technology. With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of plasma arc torches.

Latest Patents

Kulakowski's latest patents include a "Cost Effective Cartridge for a Plasma Arc Torch" and a "Swirl Ring for a Plasma Arc Torch." The cost-effective cartridge features a unique design that includes an outer component defining a hollow body and an inner component that is axially secured and rotatably engaged. This innovative design allows for improved functionality and ease of use in plasma arc applications. The swirl ring, on the other hand, is designed to receive an electrode and includes flange segments that retain a sealing member, further enhancing the performance of plasma arc torches.

Career Highlights

Dennis Kulakowski is currently employed at Hypertherm, Inc., a company renowned for its cutting-edge technology in the field of plasma cutting and welding. His work at Hypertherm has allowed him to develop and refine his inventions, contributing to the company's reputation as a leader in the industry.

Collaborations

Throughout his career, Kulakowski has collaborated with talented individuals such as Zheng Duan and Stephen Theodore Eickhoff. These collaborations have fostered an environment of innovation and creativity, leading to advancements in plasma arc technology.

Conclusion

Dennis Kulakowski's contributions to plasma arc technology through his patents and work at Hypertherm, Inc. highlight his role as a significant inventor in this field. His innovative designs continue to influence the industry and improve the efficiency of plasma arc applications.

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