Dennis K Coultas

Title: Dennis K Coultas: Innovator in Plasma Technology

Introduction

Dennis K Coultas is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of plasma technology, particularly in the manufacturing of microelectronic devices. With a total of 13 patents to his name, Coultas has developed innovative methods and apparatuses that enhance the etching processes in semiconductor fabrication.

Latest Patents

Among his latest patents is an apparatus and method for producing a negative ion plasma. This invention is crucial for the etching of microelectronic patterns in semiconductor wafers. The negative ion plasma is generated from a hot electron plasma formed by an RF or UHF plasma source. This technology ensures that the plasma remains uniform during the etching process, which is vital for achieving precision in microelectronics. Another significant patent involves cold electron plasma reactive ion etching, which utilizes a rotating magnetic field to enhance the etching of workpieces. This method allows for the effective diffusion of positive ions and cold electrons while inhibiting hot electrons, thereby improving the etching quality.

Career Highlights

Dennis K Coultas has worked with prominent companies in the technology sector, including IBM and Lam Research Corporation. His experience in these organizations has allowed him to refine his expertise in plasma technology and contribute to advancements in the field.

Collaborations

Throughout his career, Coultas has collaborated with notable professionals, including John H Keller and Michael S Barnes. These collaborations have further enriched his work and led to innovative solutions in plasma applications.

Conclusion

Dennis K Coultas stands out as a significant figure in the realm of plasma technology, with a focus on enhancing microelectronic manufacturing processes. His inventions and patents reflect a deep understanding of plasma dynamics and their applications in modern technology.