The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1998
Filed:
Dec. 20, 1995
John Howard Keller, Newburgh, NY (US);
Dennis Keith Coultas, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed is a plasma dry processing apparatus for producing a plasma with a resonance zone including a chamber for plasma processing at least one workpiece, the workpiece situated at a first end of the chamber; an induction coil at a second end of the chamber, spaced from the workpiece, for providing a radio frequency induced electromagnetic magnetic field to generate a helicon plasma within the chamber; a plurality of magnetic dipoles contained within the material of the induction coil, the magnetic dipoles having their fields directed towards the interior of, and producing a well-confined plasma within, the chamber, wherein the fields are adjacent to the second end of the chamber and keep the plasma spaced from the second end of the chamber.