River Forest, IL, United States of America

Dennis Jarnecke

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Reduct Nv. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dennis Jarnecke. Retrieved from https://idiyas.com/inventor/dennis-jarnecke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Dennis Jarnecke: Innovator in Pipeline Inspection Technology

Introduction

Dennis Jarnecke is an accomplished inventor based in River Forest, IL (US). He has made significant contributions to the field of pipeline inspection technology. His innovative approach has led to the development of a unique method for mapping and inspecting live fluid pipes.

Latest Patents

Dennis holds a patent for a "Method and system for mapping and inspecting live fluid pipes." This invention involves a sensor probe that collects geospatial data while traveling through a pipeline. The system includes a driving mechanism with a tether that allows the sensor probe to enter the pipeline at a vertical angle through a live-fluid entry apparatus. Once inside, the probe makes a 90° angle change to align with the pipeline's orientation.

Career Highlights

Dennis is currently associated with Reduct NV, where he continues to work on innovative solutions for pipeline infrastructure. His expertise in this area has positioned him as a key player in the industry.

Collaborations

Dennis collaborates with talented individuals such as William Benincosa and Jeff Mainzer, contributing to the advancement of technology in pipeline inspection.

Conclusion

Dennis Jarnecke's work exemplifies innovation in the field of pipeline inspection technology. His patent and ongoing contributions reflect his commitment to improving infrastructure safety and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…