Location History:
- Laramie, WY (US) (1977)
- Boulder, CO (US) (1997 - 2001)
- Prescott, AZ (US) (2007)
Company Filing History:
5 out of 94 
1 out of 832,843 Years Active: 1977-2007
Title: Innovations of Dennis J Knowlton
Introduction
Dennis J Knowlton is a notable inventor based in Boulder, CO (US). He has made significant contributions to the field of chemical mechanical planarization (CMP) with a total of six patents to his name. His work focuses on improving the quality control processes and measurement systems for CMP slurries used in the semiconductor industry.
Latest Patents
One of his latest patents involves a chemical mechanical planarization (CMP) slurry quality control process and particle size distribution measuring systems. This invention features a sensitive particle distribution probe that employs a modified Twomey/Chahine iterative convergence technique. It utilizes specially constructed sample cells to obtain particle size distribution measurements from optically dense slurries. The spectral transmission data is collected over a range of 0.20-2.5 microns, using chemically resistant sample cells and miniature spectrometers. The design incorporates InGaAs linear detector arrays for wavelengths greater than one micron. An ultrasonic disrupter is also included to break up harmless soft agglomerates. This invention allows for continuous, real-time sampling of undiluted slurry and can detect fundamental causes of slurry degradation, such as foaming and jelling.
Career Highlights
Throughout his career, Dennis has worked with Particle Measuring Systems, Inc., where he has contributed to advancements in slurry measurement technologies. His innovative approaches have led to improved quality control processes in the semiconductor manufacturing sector.
Collaborations
Dennis has collaborated with notable professionals in his field, including Todd A Cerni and Scott Waisanen. Their combined expertise has furthered the development of effective measurement systems for CMP slurries.
Conclusion
Dennis J Knowlton's contributions to the field of chemical mechanical planarization have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to enhance the quality control processes essential for semiconductor manufacturing.