Company Filing History:
Years Active: 1996
Title: Innovations of Dennis G Emge
Introduction
Dennis G Emge is a notable inventor based in San Jose, CA. He has made significant contributions to the field of charged particle scanning systems and automatic inspection systems. With a total of 2 patents, his work has advanced the technology used in microcircuit fabrication.
Latest Patents
One of his latest patents is an "Electron beam inspection system and method." This invention describes a method and apparatus for a charged particle scanning system that includes wafers and masks used in microcircuit fabrication. The system directs a charged particle beam at the surface of a substrate for scanning purposes. It incorporates a selection of detectors to detect secondary charged particles, back-scattered charged particles, and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage, providing at least one degree of freedom during scanning. Additionally, the substrate is subjected to an electric field to accelerate the secondary charged particles. The system is designed to facilitate inspection at low beam energies on charge-sensitive insulating substrates and accurately measure the substrate's position concerning the charged particle beam. An optical alignment system is also included for initial alignment beneath the charged particle beam. Furthermore, a vacuum system is integrated to evacuate and repressurize the chamber containing the substrate, allowing for efficient handling of multiple substrates during inspection.
Career Highlights
Dennis G Emge is associated with Kla Instruments Corporation, where he has contributed to various innovative projects. His work has been instrumental in enhancing the capabilities of inspection systems in the semiconductor industry.
Collaborations
He has collaborated with notable coworkers, including Alan D Brodie and Anil A Desai, to further advance the technology in his field.
Conclusion
Dennis G Emge's contributions to the field of charged particle scanning systems and inspection methods have significantly impacted microcircuit fabrication. His innovative patents and collaborations continue to shape the future of technology in this area.