Cherry Creek, NY, United States of America

Dennis C Pollutro


Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1992-2001

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6 patents (USPTO):Explore Patents

Title: Innovations of Dennis C Pollutro

Introduction

Dennis C Pollutro is an accomplished inventor based in Cherry Creek, NY (US). He holds a total of 6 patents that showcase his expertise in the field of electron beam printing technology. His innovative contributions have significantly advanced the efficiency and functionality of printing systems.

Latest Patents

One of his latest patents is an energy-efficient RF generator designed for driving an electron beam print cartridge to print on a moving substrate. This invention features an RF generator with a powdered iron core transformer and a dual pulse width generator, which allows for efficient operation at a frequency of about 5 MHz. This technology enables imaging on substrates moving at speeds greater than 200 feet per minute, while also addressing issues such as print gradients and transformer temperature failures.

Another notable patent is the print cartridge RF return current control. This invention utilizes a shielding conductive plane, such as a copper layer, to minimize stray electrical noise that can interfere with other sensor devices in the printer. The intermediary layer is insulated from the active area and the mechanical substrate, providing an effective way to dissipate RF high voltage bursts back to a grounding source.

Career Highlights

Throughout his career, Dennis has worked with several companies, including Moore Business Forms, Inc. and Moore U.S.A., Inc. His work has been instrumental in developing technologies that enhance the performance of printing systems.

Collaborations

Dennis has collaborated with notable coworkers such as Orrin D Christy and T F Cyman, contributing to various projects that have pushed the boundaries of printing technology.

Conclusion

Dennis C Pollutro's innovative patents and career achievements reflect his significant impact on the field of electron beam printing technology. His work continues to influence advancements in the industry, showcasing the importance of innovation in enhancing printing efficiency and performance.

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