Dennis Anthony Lyn

Title: Innovations of Dennis Anthony Lyn

Introduction

Dennis Anthony Lyn is an accomplished inventor based in West Lafayette, IN (US). He holds 2 patents that contribute significantly to the field of photochemical reactor technology. His work focuses on enhancing the understanding and efficiency of UV irradiation processes.

Latest Patents

One of his latest patents is titled "Dyed microspheres for characterization of photochemical reactor behavior." This invention involves a method for characterizing photochemical reactors using dyed microspheres exposed to UV irradiation. The process includes measuring particle-specific fluorescence intensity and simulating reactor behavior through numerical modeling. This innovative approach aims to improve the accuracy of UV dose delivery estimates in photochemical reactors.

Another notable patent is "Apparatus for improving UV dosage applied to fluids in open channel UV." This invention provides a portable module designed for irradiating fluids with multiple ultraviolet radiation-producing lamps. The apparatus includes fluid flow diverters that enhance the efficiency of UV irradiation by directing fluids toward the lamps, thereby optimizing the treatment process.

Career Highlights

Dennis has worked with reputable organizations such as Infilco Degremont, Inc. and Purdue Research Foundation. His experience in these companies has allowed him to develop and refine his innovative ideas in the field of photochemical technology.

Collaborations

Throughout his career, Dennis has collaborated with esteemed colleagues, including Ernest Rowland Blatchley, III and Kuang-Ping Chiu. These collaborations have further enriched his research and development efforts.

Conclusion

Dennis Anthony Lyn's contributions to the field of photochemical reactors through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and improve processes related to UV irradiation.